Bump-equipped electronic component and method for manufacturing bump-equipped electronic component

ABSTRACT

A bump-equipped electronic component includes a circuit substrate and first and second bumps which are disposed on a principal surface of the circuit substrate and have different cross-sectional areas in a direction parallel or substantially parallel to the principal surface. One of the first and second bumps having a smaller cross-sectional area includes a height adjustment layer disposed in a direction perpendicular or substantially perpendicular to the principal surface.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a bump-equipped electronic componentand a method for manufacturing a bump-equipped electronic component.

2. Description of the Related Art

There are known bump-equipped electronic components, for example, abump-equipped semiconductor substrate which has a plurality of bumpshaving different cross-sectional areas in a direction parallel to theprincipal surface of the semiconductor substrate (refer to JapaneseUnexamined Patent Application Publication No. 2001-223321).

In the case where bumps having different cross-sectional areas, in adirection parallel to the principal surface of a semiconductorsubstrate, are formed of plating films, since the plating film growthrate differs between the bumps having different cross-sectional areas,the resulting bumps have different heights from the principal surface ofthe substrate. Specifically, the plating film growth rate increases asthe cross-sectional area (diameter) of the bump increases. Therefore,the bump height from the principal surface of the substrate increaseswith increasing cross-sectional area of the bump.

When such a semiconductor substrate provided with bumps having differentheights is mounted on a mounting substrate, the semiconductor substratebecomes inclined relative to the mounting substrate. Consequently, anunwanted capacitance is generated between the circuit on thesemiconductor substrate and the mounting substrate, resulting in changesin the characteristics of the semiconductor chip.

Furthermore, in the case where the semiconductor substrate is mounted inan inclined manner, stress is concentrated in the connecting portion ofthe semiconductor substrate at the bump having a small cross-sectionalarea, i.e., the connecting portion of the semiconductor substrate at thebump having a small height from the principal surface, resulting infailure of a connection between the semiconductor substrate and themounting substrate.

SUMMARY OF THE INVENTION

Accordingly, preferred embodiments of the present invention preventchanges in characteristics of semiconductor chips and failure of aconnection between a semiconductor substrate and a mounting substrate.

According to a preferred embodiment of the present invention, abump-equipped electronic component includes a circuit substrate andfirst and second bumps which are disposed on a principal surface of thecircuit substrate and include different cross-sectional areas in adirection parallel or substantially parallel to the principal surface,in which one of the first and second bumps having a smallercross-sectional area includes a height adjustment layer disposed in adirection perpendicular or substantially perpendicular to the principalsurface.

Furthermore, according to a preferred embodiment of the presentinvention, a method for manufacturing a bump-equipped electroniccomponent includes a step of forming first and second bumps on aprincipal surface of a circuit substrate, the first and second bumpshaving different cross-sectional areas in a direction parallel orsubstantially parallel to the principal surface, in which the step offorming the bumps includes a step of forming a height adjustment layerin a direction perpendicular or substantially perpendicular to theprincipal surface when one of the first and second bumps having asmaller cross-sectional area is formed.

According to various preferred embodiments of the present invention, itis possible to prevent changes in characteristics of semiconductor chipsand failure of a connection between a semiconductor substrate and amounting substrate.

The above and other elements, features, steps, characteristics andadvantages of the present invention will become more apparent from thefollowing detailed description of the preferred embodiments withreference to the attached drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a cross-sectional view of a bump-equipped electronic componentaccording to a first preferred embodiment of the present invention.

FIG. 2 is a cross-sectional view of a bump-equipped electronic componentaccording to a second preferred embodiment of the present invention.

FIG. 3 is a diagram illustrating steps for manufacturing a bump-equippedelectronic component according to the first preferred embodiment of thepresent invention.

FIG. 4 is a diagram illustrating steps for manufacturing a bump-equippedelectronic component according to the second preferred embodiment of thepresent invention.

FIG. 5 is a diagram illustrating one of the steps for manufacturing abump-equipped electronic component according to the first and secondpreferred embodiments of the present invention.

FIG. 6 is a block diagram of a power amplifier according to a fourthpreferred embodiment of the present invention.

FIG. 7 is a plan view showing a mounted state of a power amplifiermodule constituting the power amplifier according to the fourthpreferred embodiment of the present invention.

FIG. 8 is a cross-sectional view taken along I-I of FIG. 7.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

First Preferred Embodiment

FIG. 1 is a cross-sectional view of a bump-equipped electronic component(hereinafter referred to as the “electronic component”), such as asemiconductor chip, according to a first preferred embodiment of thepresent invention.

A circuit substrate 1 of an electronic component 100 is a semiconductorsubstrate or a piezoelectric substrate includes in a surface acousticwave (SAW) filter or the like. Examples of the semiconductor substrateinclude a GaAs substrate and a Si substrate, and examples of thepiezoelectric substrate include a LiTaO₃ substrate and a LiNbO₃substrate. A semiconductor circuit (not shown) is provided on aprincipal surface 1 a of the circuit substrate 1.

Cylindrical bumps B1 and B2 having different cross-sectional areas in adirection parallel or substantially parallel to the principal surface 1a (hereinafter referred to as the “cross-sectional areas”) are providedon the circuit substrate 1. A cross-sectional area S1 of the bump B1 issmaller than a cross-sectional area S2 of the bump B2. The height ofeach of the bumps B1 and B2 from the principal surface 1 a preferably isabout 50 μm, for example. The bumps B1 and B2 preferably are mainlycomposed of Cu, and Au can also be used in addition to Cu. The bumps B1and B2 are preferably formed, for example, by electrolytic plating. Aprotective film 8 (e.g., SiN_(x); thickness: about 0.5 μm) is located ina region on the circuit substrate 1 other than regions in which thebumps B1 and B2 are located. The shape of each of the bumps B1 and B2 isnot limited to the cylindrical shape, but may be a rectangular columnarshape or the like.

The bump B1 includes an Au pad 21, a metal layer 31, a Cu pillar 41, anda height adjustment layer 5, and the Au pad 21, the metal layer 31, theCu pillar 41, and the height adjustment layer 5 are stacked in thatorder on the circuit substrate 1. The bump B2 includes an Au pad 22, ametal layer 32, and a Cu pillar 42, and the Au pad 22, the metal layer32, and the Cu pillar 42 are stacked in that order on the circuitsubstrate 1.

The Au pads 21 and 22 are located on the circuit substrate 1 and used asinput/output electrodes for electric signals. The metal layers 31 and 32preferably are seed electrode layers for plating, for example, composedof Ti (thickness: about 0.1 μm) and Cu (thickness: about 0.1 μm). The Cupillars 41 and 42 preferably are layers formed by electrolytic plating.The height adjustment layer 5 is an electrode layer preferably composedof Cu to adjust the height of the bump B1 on the principal surface 1 ato be the same as the height of the bump B2, and is formed, for example,by an ink-jet method, which will be described later. The heightadjustment layer 5 and the bump B1 have the same cross-sectional areaS1.

In the electronic component 100 having the configuration describedabove, even when two bumps B1 and B2 having different cross-sectionalareas are present, the height from the principal surface 1 a of thecircuit substrate 1, i.e., the height of the electronic component 100,can be made uniform. Consequently, when the electronic component 100 ismounted on the principal surface of a mounting substrate with the bumpsB1 and B2 therebetween, the inclination of the electronic component 100can be eliminated, and it is possible to prevent occurrence of failureof a connection between the electronic component 100 and the mountingsubstrate (unconnected bumps). This can improve the mounting yield ofthe electronic component 100. Furthermore, since the electroniccomponent 100 is not mounted on the mounting substrate in an inclinedmanner, an unwanted capacitance is not generated between thesemiconductor circuit of the electronic component 100 and the mountingsubstrate, and it is possible to prevent changes in the characteristicsof the semiconductor circuit.

In the preferred embodiment described above, the height adjustment layer5 is preferably composed of the same material as the main material (Cu)constituting the bump B1. However, the height adjustment layer 5 may becomposed of a different material, for example. For example, as thematerial of the height adjustment layer 5, gold, silver, aluminum,platinum, tantalum, titanium, or the like can be used. When gold,silver, or aluminum is used, since it preferably has substantially thesame mechanical characteristics as those of copper which is the mainmaterial, thermal stress due to heating at the time of mounting bumpsand mechanical stress at the time of pressure application is relaxed.Furthermore, when platinum, tantalum, or titanium is used, solderabilityat the time of mounting bumps can be improved.

Furthermore, since the height adjustment layer 5 is disposed on the topend of the bump B1, the height of the bump B1 in a directionperpendicular or substantially perpendicular to the principal surface 1a can be easily adjusted.

Furthermore, the height adjustment layer 5 and the bump B1 have the samecross-sectional area S1. Consequently, since the bump B1 does not expandin a direction parallel or substantially parallel to the principalsurface 1 a of the circuit substrate 1, the mounting area of theelectronic component 100 is decreased.

Furthermore, the height adjustment layer 5 may have a resistivity thatis different from the resistivity of a main material (Cu) constitutingthe bump B1 provided with the height adjustment layer 5. In the casewhere a metal material different from the main material constituting thebump B1, for example, a metal material having a high resistance, is usedas the material for the height adjustment layer 5, a resistor is definedusing the bump B1. Accordingly, the bump B1 is used as a circuit in theelectronic component 100, and the design freedom of the electroniccomponent 100 is improved.

Second Preferred Embodiment

A second preferred embodiment of the present invention will now bedescribed. The second preferred embodiment differs from the firstpreferred embodiment in that the height adjustment layer 5 is disposedin the middle of the bump B1, i.e., a barrier metal layer and a solderlayer are further stacked on the height adjustment layer 5. The sameelement as that of the first preferred embodiment is denoted with thesame reference sign, and detailed description thereof will be omitted.

As shown in FIG. 2, in a bump B1 of an electronic component 101, abarrier metal layer 61 and a solder layer 71 are stacked in that orderon a height adjustment layer 5. In a bump B2, a barrier metal layer 62and a solder layer 72 are stacked in that order on a Cu pillar 42. Thebarrier metal layer 61 and the solder layer 71 each have across-sectional area S1, and the barrier metal layer 62 and the solderlayer 72 each have a cross-sectional area S2.

The barrier metal layers 61 and 62 preferably are each composed of, forexample, Ni (thickness: about 0.5 μm). The solder layers 71 and 72 areeach preferably composed of, for example, an Ag—Sn-based solder.

In the electronic component 101 according to the second preferredembodiment, since the height adjustment layer 5 is disposed in themiddle of the bump B1 (not as a top end layer or a layer on the side ofthe principal surface of the substrate), the same metal material(solder: Ag—Sn, in the second preferred embodiment) as that of the otherbump B2 can be disposed on the top end of the bump B1, and electricalcharacteristics and electrical connection reliability are equalizedbetween the bumps B1 and B2.

Furthermore, as the material for the height adjustment layer 5, amaterial for forming an insulating film, such as SiN_(x) or SiO₂, may beused. In such a case, the Cu pillar 41-height adjustment layer 5-barriermetal layer 61 (metal-insulator-metal) defines a metal-insulation-metal(MIM) capacitor, and a capacitor can be provided in the electroniccomponent 101. Furthermore, in the case where the bump B1 is mounted ona separately prepared mounting substrate or the like, the bump B1functions as a terminal electrode. A MIM capacitor can be formed in theterminal electrode, and it is possible to configure such thatradio-frequency signals only are transmitted and direct-current signals,such as signals from a power source and control signals, are blocked.

Third Preferred Embodiment

A third preferred embodiment will now be described with reference toFIG. 2. The third preferred embodiment differs from the second preferredembodiment in that the solder layers 71 and 72 are preferably made ofdifferent materials depending on the cross-sectional area of the bump.The same element as that of the second preferred embodiment is denotedwith the same reference sign, and detailed description thereof will beomitted.

Sn—Bi is preferably used as the material for the solder layer 71 shownin FIG. 2, and Ag—Sn is preferably used as the material for the solderlayer 72. In other words, in the bump B1 having a smallercross-sectional area, a Sn—Bi-based solder that has a lower meltingpoint than an Ag—Sn-based solder is preferably used, and in the bump B2having a larger cross-sectional area, an Ag—Sn-based solder that has ahigher melting point is preferably used.

In the electronic component 101 according to the third preferredembodiment, when the solder layers 71 and 72 of the bumps B1 and B2 aremelted and then hardened in the reflow soldering process or the like(for example, when the electronic component 101 is mounted on a mountingsubstrate), the solder layer 72 of the bump B2 having a largercross-sectional area is hardened first at a higher temperature, andsubsequently, the solder layer 71 of the bump B1 having a smallercross-sectional area is hardened at a lower temperature. When a solderlayer is hardened, contraction stress occurs because the solvent and thelike contained in the solder layer evaporate. As the cross-sectionalarea of a bump increases, the contraction stress thereof increases.Therefore, by hardening the bump B2 having a larger cross-sectional areafirst, the contraction stress applied to the bump B1 having a smallercross-sectional area during being hardened is reduced, and thusconnection reliability of the bumps B1 and B2 to the mounting substrateis improved.

An example of a method for manufacturing the electronic component 100according to the first preferred embodiment will be described in detailwith reference to FIG. 3.

First, a semiconductor circuit (not shown) is formed on a circuitsubstrate 1 by a normal semiconductor process, and then, openings areformed by a lithographic technique or the like in a SiN_(x) protectivefilm 8 to expose Au pads (electric signal input/output pads) 21 and 22(step (a) in FIG. 3).

Next, Ti (thickness: 0.1 μm) and Cu (thickness: 0.1 μm) for forming seedelectrodes for plating are deposited in that order, for example, bysputtering over the entire surface of the semiconductor circuit (step(b) in FIG. 3). As a result, a metal layer 3 is formed.

Next, a photoresist 9 is applied by coating onto the metal layer 3, andexposure and development are performed using a photomask. As a result,openings are formed at regions where Cu pillars 41 and 42 are to beformed (step (c) in FIG. 3).

Next, Cu is deposited by electrolytic plating in the photoresistopenings to form Cu pillars 41 and 42 (step (d) in FIG. 3). In thisstep, since the electrolytic plating growth rate differs depending onthe cross-sectional area, the Cu pillar 41 with the cross-sectional areaS1 and the Cu pillar 42 with the cross-sectional area S2 (>S1) havedifferent heights. As shown in FIG. 3, the height of the Cu pillar 42from the principal surface 1 a of the circuit substrate 1 is larger thanthe height of the Cu pillar 41.

Next, the photoresist is removed, and the seed electrodes for platingother than the Cu pillars 41 and 42 are removed by etching (step (e) inFIG. 3).

Next, a conductive paste containing Cu for adjustment is deposited by anink-jet method on the desired Cu pillar only. In this manufacturingmethod, the Cu material is deposited on the Cu pillar 41 of the bump B1(step (f) in FIG. 3).

Next, the Cu material deposited by the ink-jet method is solidified byheat treatment (step (g) in FIG. 3). As a result, the height adjustmentlayer 5 is formed on the bump B1.

An electronic component 100 according to the first preferred embodimentcan be fabricated through the steps (a) to (g) shown in FIG. 3.Furthermore, the height adjustment layer 5 can be formed using aphotolithographic technique, thick film printing, or the like, insteadof the ink-jet method. However, in the ink-jet method, since aconductive paste in the form of liquid drops is used, the heightadjustment layer 5 can be formed with high accuracy.

An example of a method for manufacturing the electronic component 101according to the second preferred embodiment will be described in detailwith reference to FIG. 4. Since steps (a) to (g) are preferably the sameas the steps (a) to (g) described with reference to FIG. 3, the drawingand description thereof will be omitted. Steps (h) to (k) subsequent tothe step (g) will be described in detail.

After undergoing the heat hardening step (step (g) in FIG. 3), a barriermetal material (e.g., conductive paste containing Ni) is deposited by anink-jet method on the Cu pillars 41 and 42 (step (h) in FIG. 4), and thedeposited Ni material is solidified by heat treatment (step (i) in FIG.4). As a result, barrier metal layers 61 and 62 are formed on the heightadjustment layer 5 of the bump B1 and the Cu pillar 42 of the bump B2,respectively.

Next, a solder material (e.g., Ag—Sn) is deposited by an ink-jet methodon the barrier metal layers 61 and 62 (step (j) in FIG. 4), and thedeposited solder material is solidified by heat treatment (step (k) inFIG. 4). As a result, solder layers 71 and 72 are deposited on thebarrier metal layers 61 and 62, respectively.

An electronic component 101 according to the second preferred embodimentcan be fabricated through the steps (a) to (g) shown in FIG. 3 and thesteps (h) to (k) shown in FIG. 4. Note that an electronic component 101according to the third preferred embodiment can be fabricated bydepositing different solder materials on the barrier metal layers 61 and62.

In the first to third preferred embodiments, description has been madeof the case where the bumps B1 and B2 are located on the principalsurface 1 a of the circuit substrate 1. However, the present inventionis not limited thereto. For example, the electronic component 100 or 101of preferred embodiments of the present invention may be configured suchthat three or more bumps having different cross-sectional areas in adirection parallel or substantially parallel to the principal surface 1a of the substrate are provided, and a height adjustment layer 5 isdisposed on at least one of the bumps.

Furthermore, in the first to third preferred embodiments, descriptionhas been made of the case where the height of the bump B1 from theprincipal surface 1 a is adjusted by the height adjustment layer 5 tothe same height as the height of the bump B2 from the principal surface1 a. However, the present invention is not limited thereto. For example,a configuration may be used in which each of bumps B1 and B2 includes aheight adjustment layer 5 which adjusts the height from the principalsurface 1 a to a predetermined height.

The step of forming the height adjustment layer 5 (step (f) in FIG. 3),which is one of the steps described with reference to FIG. 3, will bedescribed in detail.

FIG. 5 is a diagram illustrating the step of forming the heightadjustment layer 5. As shown in FIG. 5, an ink-jet system 110 used toform the height adjustment layer 5 includes a bump height measurementdevice 120 which measures the height of the bump B1 and the like of theelectronic component 100, a stage 130 which transfers a wafer W, anink-jet device 140 which forms the height adjustment layer 5 by anink-jet method using a conductive paste, and a control device 150 whichcontrols the bump height measurement device 120, the stage 130, and theink-jet device 140. Furthermore, the wafer W includes a plurality ofelectronic components 100 (hereinafter, also referred to as “electroniccomponents A, B, C, and D”).

First, the stage 130 transfers the wafer W, on the basis of the controlof the control device 150, to a predetermined position. For example, amethod may be used in which an image of the wafer W is taken by a cameraor the like in advance, the position of the Cu pillar 41 is detected byprocessing the resulting image, and the wafer W is transferred on thebasis of the detection results. Alternatively, a method may be used inwhich information, such as the position of the Cu pillar 41 in the waferW, is stored in a predetermined memory of the control device 150 inadvance, and the wafer W is transferred on the basis of the informationstored in the memory.

When the wafer W is transferred and the Cu pillar 41 is locatedperpendicularly or substantially perpendicularly below the bump heightmeasurement device 120, the bump height measurement device 120 measuresthe height of the Cu pillar 41 from the principal surface 1 a, using alaser or the like, and sends control information showing the measuredheight of the pillar 41 and the position (coordinates in the wafer W) ofthe Cu pillar 41 to the control device 150. The bump height measurementdevice 120 carries out such a process each time when the Cu pillar 41 ofeach electronic component 100 is located perpendicularly orsubstantially perpendicularly below the bump height measurement device120.

Next, the wafer W is transferred by the stage 130. When the Cu pillar 41subjected to the bump height measurement is located perpendicularly orsubstantially perpendicularly below the ink-jet device 140, the controldevice 150 adjusts the ink jetting amount, on the basis of the height ofthe Cu pillar 41 from the principal surface 1 a included in the controlinformation, such that the height of the Cu pillar 41 (bump B1) becomesequal to the height of the Cu pillar 42 (bump B2), and the ink-jetdevice 140 ejects the Cu material onto the Cu pillar 41. In this case,the ink jetting amount may be set in advance, or an amount correspondingto the difference between the height of the Cu pillar 42 and the heightof the Cu pillar 41 is calculated, and the calculated amount may beconsidered as a jetting amount. In such a manner, the Cu material isdeposited on the Cu pillar 41 and then subjected to heat treatment toform the height adjustment layer 5.

In the step of forming the height adjustment layer 5, even when thereare a plurality of Cu pillars 41, on each of which a height adjustmentlayer 5 is to be formed, height adjustment layers 5 can be formed on theCu pillars 41 of all the electronic components A, B, C, D, and the likein the wafer by one process, and a complicated process is not needed.

In the case of an electronic component 100 configured to have three ormore bumps having different cross-sectional areas in a directionparallel or substantially parallel to the principal surface 1 a of thesubstrate, a height adjustment layer 5 may be formed on at least one ofthe Cu pillars of the bumps so as to achieve the same height as theheight of the bump having the largest height from the principal surface1 a. Furthermore, in the case of an electronic component 100 in which aheight adjustment layer is formed in each of bumps B1 and B2 so as toadjust the height from the principal surface 1 a to a predeterminedheight, a height adjustment layer 5 may be formed on each of the bumpsB1 and B2 so as to achieve the predetermined height. Even in thesecases, height adjustment layers 5 can be formed on all of the intendedCu pillars (bumps) in the wafer W by one process, and a complicatedprocess is not needed.

Fourth Preferred Embodiment

A fourth preferred embodiment will now be described. In the fourthpreferred embodiment, description will be made on a power amplifier 200in which an electronic component 100 according to a preferred embodimentof the present invention is flip-chip mounted.

FIG. 6 is a block diagram of the power amplifier 200. As shown in FIG.6, the power amplifier 200 includes a radio frequency input terminal 210into which a radio-frequency signal is input, a first amplifier circuit230 and a second amplifier circuit 250 which amplify the input signalfrom the radio frequency input terminal 210, and a radio frequencyoutput terminal 270 from which the radio frequency signal is output. Thepower amplifier 200 also includes an input matching circuit 220 whichmatches impedance between the radio frequency input terminal 210 and theinput terminal of the first amplifier circuit 230, an interstagematching circuit 240 which matches impedance between the output terminalof the first amplifier circuit 230 and the second amplifier circuit 250,and an output matching circuit 260 which matches impedance between theoutput terminal of the second amplifier circuit 250 and the radiofrequency output terminal 270.

FIG. 7 is a plan view showing a mounted state of a power amplifiermodule 300 constituting the power amplifier 200, and FIG. 8 is across-sectional view taken along I-I of FIG. 7.

As shown in FIG. 8, the power amplifier module 300 includes threeinsulating layers 311 to 313 and four conductor layers 321 to 324, whichare alternately stacked, and an electronic component 100 is flip-chipmounted on the conductor layer 322. As shown in FIGS. 7 and 8, aplurality of passive elements 301 are disposed on a plurality ofconductor layers 321 on the insulating layer 311 of the power amplifiermodule 300 so as to connect the conductor layers 321.

In the power amplifier module 300 according to the fourth preferredembodiment, since the electronic component 100 or 101, in which the bumpB1 is adjusted by the height adjustment layer 5, is flip-chip mounted,when the electronic component 100 or 101 is connected to the conductorlayer 322 of the mounting substrate, occurrence of failure of aconnection (unconnected bumps) is prevented, and the production yield ofthe power amplifier is improved. Furthermore, it is possible to preventchanges in the characteristics of the semiconductor circuit of theelectronic component 100. Furthermore, it is possible to adjust themechanical characteristics and electrical characteristics of theelectronic component 100 or 101.

The above described first to fourth preferred embodiments are intendedto facilitate understanding of the present invention, and are notintended to limit the present invention. The present invention can bechanged or improved without departing from the spirit thereof, andincludes equivalents thereof.

While preferred embodiments of the present invention have been describedabove, it is to be understood that variations and modifications will beapparent to those skilled in the art without departing from the scopeand spirit of the present invention. The scope of the present invention,therefore, is to be determined solely by the following claims.

What is claimed is:
 1. A bump-equipped electronic component comprising:a circuit substrate; and first and second bumps primarily composed ofCu, disposed on a principal surface of the circuit substrate and havingdifferent cross-sectional areas in a direction parallel or substantiallyparallel to the principal surface of the substrate; wherein each of thefirst and second bumps includes seed layers, a pillar, an ink-jettedheight adjustment layer, a barrier metal layer, and a solder layerstacked in that order on the principal surface of the circuit substrate;and the height adjustment layer adjusts a height from the principalsurface of the substrate to a standard height.
 2. The bump-equippedelectronic component according to claim 1, wherein each of the heightadjustment layers and the corresponding one of the first and secondbumps have the same cross-sectional area in the direction parallel orsubstantially parallel to the principal surface.
 3. The bump-equippedelectronic component according to claim 1, wherein each of the heightadjustment layers has a resistivity that is different from a resistivityof the Cu from which the respective one of the first and second bumps isprimarily composed.
 4. The bump-equipped electronic component accordingto claim 1, wherein the solder layer of one of the first and secondbumps having a larger cross-sectional area in the direction parallel orsubstantially parallel to the principal surface has a higher meltingpoint than that of the solder layer of the bump having a smallercross-sectional area in direction parallel or substantially parallel tothe principal surface.